Faculty Member at
International Center for Nano Technology
and Applied Adhesion


 

Bibhu Prasad Swain

 

Name
Bibhu Prasad Swain

Position
 
Assistant Professor (I): International Centre for Nano Technology and Applied Adhesion (ICNTAA), Sikkim Manipal University, Sikkim, India

Academic Degree

Ph.D. (Materials Science and Metallurgy)

Fax
+91-3592246112
E-mail
bpswain@livemail.smu.edu.in,bibhuprasad.swain@gmail.com
Website
http://bibhuprasadswain.tech.officelive.com
Postal Address
Department of Nanotechnology; Sikkim Manipal Institute of Technology, Majitar, 737132 Sikkim, India

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Thesis titles

  • PhD thesis: Study of hydrogenated amorphous silicon carbon alloys deposited by hot wire chemical vapor deposition.
  • M. Tech thesis: Synthesis and characterization of Nb/Cu multilayer by e-beam deposition.
Experience:

  • Teaching Assistant: Indian Institute of Technology, Bombay (January 2001-March 2005)
  • Project Assistant: Indian Institute of Technology, Bombay (March 2005-August 2005)
  • Project Scientist: Indian Institute of technology, Kanpur (September 2005- July 2006)
  • Postdoctoral Fellow: University of Cape Town, South Africa (September 2005-January 2007)
  • Brain Korea 21 Fellow: Seoul National University, Seoul, South Korea (January 2007- November 2008)
  • JSPS Fellow: National Institute of Advanced Industrial Science and Technology, Japan (November 2008-November 2010)
  • Assistant Professor, International Centre for Nanotechnology, SMIT, Sikkim (2011 - present)
Research Areas and Interests

  • Amorphous and nanocrystalline semiconductors
  • Photovoltaics cells materials
  • Hard and soft coating materials
  • Chemical vapor deposition and Physical vapor deposition
  • Surface passivation and surface modification
Selected Publications :

  • [1] Bhabani S. Swain, Bibhu P. Swain, Nong M. Hwang, Hydrogen dilution-induced chemical state modifications in silicon nanowires, Journal of Physical Chemistry C,114 (2010) 15274–15279.

    [2] Bhabani S. Swain, Bibhu P. Swain, Nong M. Hwang, Investigation of plasmon loss and valence band structure of silicon nanowires deposited by atmospheric pressure chemical vapour deposition. Journal of Applied Physics, 108 (2010) 073709-073714.

    [3] Bibhu P. Swain, H. Takato, I. Sakata. Wet chemical surface passivation of germanium wafers by quinhydrone-methanol treatment for minority carrier lifetime measurements, Applied Physics Express, 2 (2009) 10551.

    [4] Bibhu P. Swain, Bhabani S. Swain, Sung H. Park, Nong M. Hwang,  Plasmon loss and valence band structure of silicon-based alloys deposited by hot wire chemical vapor deposition, Journal of Alloys and Compounds,480 (2009) 878–881.

    [5] Bibhu P. Swain, The analysis of carbon bonding environments in the HWCVD deposited a-SiC:H films by XPS and Raman spectroscopy. Surface Coating Technology 201(2006)1589-1593. 

    [6] Bibhu P. Swain, Rajiv O. Dusane, Multiphase structure of hydrogen diluted a-SiC:H deposited by HWCVD. Material Chemistry and Physics 99 (2006) 240-246.

    [7] Bibhu P. Swain, H. Takato, Z. N. Liu, I. Sakata, Ambient Stability of Wet Chemically Passivated Germanium Wafer for Crystalline Solar cells, Solar Energy Materials and Solar Cells,95(2011)84-88.
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